Low-pulse, ultra-high-resolution dispensing solution for semiconductor manufacturing.
Semiconductor process optimization: low pulsation, ultra-high precision liquid delivery solution.
In the further miniaturization and high integration of semiconductor manufacturing, what influences product quality and yield is **"the extreme precision of liquid handling."** Particularly in next-generation processes where even slight flow variations can lead to catastrophic defects, challenges have emerged that conventional liquid delivery systems cannot address. The Cavro Centris Pump provides unprecedented stability in each process as miniaturization advances, thanks to its industry-leading resolution (up to 192,000 steps). 【Application Scenes】 - Precision dispensing of photoresist (lithography) - Supply of resin for nanoimprinting - Flow control for slit die coating (thin film formation) - Automatic adjustment of electroless plating solutions - Additive management for electroplating (ECP) - Inline blending of chemicals - Precise supply of slurry and additives in CMP (chemical mechanical polishing) processes 【Effects of Implementation】 The Centris Pump eliminates slight variations and pulsations in discharge volume that can cause coating inconsistencies, contributing to a dramatic improvement in yield. Its compact design, intended for integration into equipment, maximizes design flexibility for upgrading existing systems and developing next-generation devices.
- Company：テカンジャパン
- Price：Other
